Supply nozzle for applying liquid resist to a semiconductor wafe

Details Supply nozzle for applying liquid resist to a semiconductor wafe Supply nozzle for applying liquid resist to a semiconductor wafe

1991-08-21

1993-11-16

Burke, Wallace R.

Environmental heating and cooling; fluid handling and sanitary e

Fluid handling or treatment equipment

Dispersal

Patent

active

D03414183

REFERENCES:
patent: D218239 (1970-08-01), Stairs
patent: D230641 (1974-05-01), Moubray
patent: D231098 (1974-04-01), Pinke
patent: 3093316 (1963-06-01), Hedeman
patent: 4907931 (1990-03-01), Mallory et al.
patent: 5002008 (1991-03-01), Ushijima et al.
patent: 5069591 (1991-12-01), Kinoshita

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