Coating apparatus – Gas or vapor deposition
Patent
1994-10-12
1996-05-14
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
13759616, C23C 1600, F17D 104
Patent
active
055163661
ABSTRACT:
A supply control apparatus for semiconductor process gasses which is capable of accurately switching the timing of the supply state of the gasses flowing in accordance with the open or closed states of a plurality of gas pressure operated valves, which operate in response to a plurality of electromagnetic valves operating in time series. The content volumes of a plurality of gas tubes respectively connecting the plurality of electromagnetic valves to the plurality of drive units of the gas pressure operated valves are determined as a function of the length of time elapsed between the application of the control signal and the time the special gas is supplied to a process unit. The apparatus permits accurate switching of the supply state of the special gasses and avoids the mixing of the semiconductor process gasses.
REFERENCES:
patent: 3796229 (1974-03-01), Wright
patent: 4080154 (1978-03-01), Kinsella
patent: 4358927 (1982-11-01), Day
patent: 4369031 (1983-01-01), Goldman
patent: 4426683 (1984-01-01), Kissell
patent: 5160542 (1992-11-01), Mihira
patent: 5250323 (1993-10-01), Miyazaki
patent: 5322568 (1994-06-01), Ishihara
Kanno Yohichi
Murakami Kohichi
Ohmi Tadahiro
Uchisawa Osamu
Breneman R. Bruce
Kabushiki-Kaisha Motoyama Seisakusho
Lund Jeffrie R.
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