Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2008-01-29
2008-01-29
Barr, Michael (Department: 1746)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S002000, C134S022100
Reexamination Certificate
active
07323064
ABSTRACT:
The invention includes a method of cleaning a processing chamber by introducing supercritical fluid into the processing chamber. A residue over an internal chamber surface is contacted with the supercritical fluid to remove the residue from the surface. The invention also includes a method of removing deposited material from internal surfaces of a processing system. A cleaning agent comprising at least one of C3H8, C2H6and CH4is provided in supercritical phase into at least a portion of the processing system. A material deposited on an internal surface of the processing system is contacted with the cleaning agent to remove at least a portion of the deposited material.
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Basceri Cem
Sandhu Gurtej S.
Barr Michael
Chaudhry Saeed
Micro)n Technology, Inc.
Wells St. John P.S.
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