Supercritical fluid-assisted direct write for printing...

Details Supercritical fluid-assisted direct write for printing... Supercritical fluid-assisted direct write for printing...

2005-05-24

2008-11-04

Nguyen, Anthony H. (Department: 2854)

Printing

Processes

C101S491000

Reexamination Certificate

active

07444934

ABSTRACT:
High resolution patterns provided on a surface of a semiconductor substrate and methods of direct printing of such high resolution patterns are disclosed. The high resolution patterns may have dimensions less than 0.1 micron and are formed by a direct writing method employing a supercritical fluid comprising nanometer-sized particles, which may be optionally electrically charged.

REFERENCES:
patent: 4013502 (1977-03-01), Staples
patent: 4582731 (1986-04-01), Smith
patent: 6660176 (2003-12-01), Tepper et al.
patent: 6666986 (2003-12-01), Vaartstra
patent: 6780249 (2004-08-01), Nelson et al.

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