Sulfonium salt-containing polymer, resist composition, and...

Details Sulfonium salt-containing polymer, resist composition, and... Sulfonium salt-containing polymer, resist composition, and...

2009-04-23

2011-11-01

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S327000, C430S311000, C430S330000, C430S942000, C430S966000, C526S243000, C526S245000, C526S287000

Reexamination Certificate

active

08048610

ABSTRACT:
A polymer comprising recurring units having formulae (1), (2) and (3) is provided as well as a chemically amplified resist composition comprising the same. R1is H, F, CH3or CF3, Rf is H, F, CF3or C2F5, A is an optionally fluorine or oxygen-substituted divalent organic group, R2, R3and R4are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or may form a ring with the sulfur atom, N=0-2, R8is H or alkyl, B is a single bond or optionally oxygen-substituted divalent organic group, a=0-3, b=1-3, and X is an acid labile group. The polymer generates a strong sulfonic acid which provides for effective cleavage of acid labile groups in a chemically amplified resist composition.

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