Sulfonium salt compound, photoacid generator, and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S905000, C430S910000, C430S922000, C549S013000, C549S029000, C549S088000, C549S090000, C568S027000, C568S028000

Reexamination Certificate

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10543092

ABSTRACT:
A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator.The sulfonium salt compound is shown by the following formula (I),wherein R1represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR3group, wherein R3is a monovalent alicyclic hydrocarbon group, R2represents a (substituted)-alkyl group or two or more R2groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X−indicates a sulfonic acid anion.The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

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H. Bosshard, “5. Über die Anlagerung von Thioäthern an Chinone und Chinonimine in Stark sauren Medien,” Helvetica Chimica Acia, vol. 55, No. 1, pp. 32-37 (1972).

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