Sulfonium salt compound, photoacid generator, and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S905000, C430S910000, C430S922000, C549S013000, C549S029000, C549S088000, C549S090000, C568S027000, C568S028000

Reexamination Certificate

active

07371503

ABSTRACT:
A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator.The sulfonium salt compound is shown by the following formula (I),wherein R1represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR3group, wherein R3is a monovalent alicyclic hydrocarbon group, R2represents a (substituted)-alkyl group or two or more R2groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X−indicates a sulfonic acid anion.The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

REFERENCES:
patent: 5919596 (1999-07-01), Hedrick et al.
patent: 6187504 (2001-02-01), Suwa et al.
patent: 6908722 (2005-06-01), Ebata et al.
patent: 2005/0266336 (2005-12-01), Kodama
patent: 2005/0287473 (2005-12-01), Kodama
patent: 100 54 550 (2001-05-01), None
patent: 0 849 634 (1998-06-01), None
patent: 1235815 (1971-06-01), None
patent: 2002-229192 (2002-08-01), None
H. Bosshard, “5. Über die Anlagerung von Thioäthern an Chinone und Chinonimine in Stark sauren Medien,” Helvetica Chimica Acia, vol. 55, No. 1, pp. 32-37 (1972).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sulfonium salt compound, photoacid generator, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sulfonium salt compound, photoacid generator, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sulfonium salt compound, photoacid generator, and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2801653

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.