Sulfonates, polymers, resist compositions and patterning...

Details Sulfonates, polymers, resist compositions and patterning... Sulfonates, polymers, resist compositions and patterning...

2006-10-24

2006-10-24

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S907000, C430S910000, C558S044000, C558S056000, C526S243000, C526S281000, C526S287000, C526S317100, C526S319000, C526S334000

Reexamination Certificate

active

07125642

ABSTRACT:
A sulfonate compound having formula (1) is novel wherein R1to R3are H, F or C1-20alkyl or fluoroalkyl, at least one of R1to R3contains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance

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Hiroshi, Ito et al., “Polymer design for 157 nm chemically amplified resists”, SPIE 2001, Proceedings 4345-31, pp. 273-285.

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