Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-06-25
1982-02-09
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430270, 430281, 430285, 428480, 428910, G03C 178
Patent
active
043150667
ABSTRACT:
Substrates suitable for the production of photopolymerizable elements comprise an adhesive layer capable of providing durable adhesion between a photopolymerizable layer and a plastics film or sheet, wherein the adhesive layer comprises an unsaturated resin having the formula: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and represent lower alkyl groups having up to 6 carbon atoms, x and y are the same or different and are an integer from 1 to 4 inclusive and n is an integer from 4 to 30 inclusive. The preferred resin is a propoxylated bisphenol A-fumarate condensate. Suitable for the production of photorelief printing plates.
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patent: 4175156 (1979-11-01), Ikins
Bexford Limited
Brammer Jack P.
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