Substrate washing device

Details Substrate washing device Substrate washing device

1993-11-09

1994-12-06

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

118500, 134186, 134201, 134902, 206334, 206454, 211 41, B08B 304

Patent

active

053701429

ABSTRACT:
A substrates-cleaning apparatus comprising process vessels in which washing solutions are contained, a chuck mechanism having a first substrate holder section for carrying silicon wafers to the process vessels while holding them in it, and a boat mechanism having a second substrate holder section for receiving the wafers from the chuck mechanism and for supporting the wafers in the washing solutions, wherein said second substrate holder section comprises base members made of erosion and heat resistant material, and receiver members attached to the base members, having a plurality of substrate holding grooves thereon, and made of erosion and heat resistant synthetic resin substantially same in softness as or softer than the wafers.

REFERENCES:
patent: 4653636 (1987-03-01), Armstrong
patent: 4728246 (1988-03-01), Mello
patent: 5213118 (1993-05-01), Kamikawa
patent: 5226437 (1993-07-01), Kamikawa et al.
patent: 5301700 (1994-04-01), Kamikawa et al.

Affiliated with

Also associated with

Rating

Substrate washing device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate washing device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate washing device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-208060