Substrate used for immersion lithography process, method of...

Details Substrate used for immersion lithography process, method of... Substrate used for immersion lithography process, method of...

2007-07-24

2010-10-19

Kelly, Cynthia H (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S272100

Reexamination Certificate

active

07816070

ABSTRACT:
A substrate having a photoresist film, capable of easily performing immersion lithography with high precision and stability, is provided. A surface tension of the substrate in a periphery region is lower than that of the substrate in a rest region. Immersion liquid supplied onto the photoresist film hardly leaks out, and the bubbles hardly occur in the immersion liquid.

REFERENCES:
patent: 2002/0110760 (2002-08-01), Lin
patent: 2007/0066080 (2007-03-01), Kugler et al.
patent: A-2005-183709 (2005-07-01), None
patent: A-2006-019742 (2006-01-01), None
patent: A-2006-108564 (2006-04-01), None
patent: A-2006-186112 (2006-07-01), None
patent: 20030002323 (2003-09-01), None

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