Substrate treating apparatus

Details Substrate treating apparatus Substrate treating apparatus

2007-01-09

2007-01-09

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

For liquid etchant

C134S135000

Reexamination Certificate

active

11081139

ABSTRACT:
A substrate treating apparatus for treating substrates as immersed in a treating solution includes a treating tank for storing the treating solution and accommodating the substrates, a holding mechanism for holding a plurality of substrates in upstanding posture in the treating tank, and a drive mechanism for revolving the holding mechanism about a virtual horizontal axis extending in a direction of alignment of the plurality of substrates. The plurality of substrates are treated, while the holding mechanism holding the plurality of substrates is immersed in the treating solution, and the drive mechanism is operated to revolve the plurality of substrates about the horizontal axis.

REFERENCES:
patent: 5816274 (1998-10-01), Bartram et al.
patent: 6513537 (2003-02-01), Orii et al.
patent: 6767840 (2004-07-01), Uehara et al.
patent: 6797075 (2004-09-01), Ching et al.
patent: 2002/0170571 (2002-11-01), Egashira et al.
patent: 2004/0071531 (2004-04-01), Hiroe et al.
patent: 2005/0039776 (2005-02-01), Yi et al.
patent: 8-215647 (1996-08-01), None
patent: 2000-235967 (2000-08-01), None
patent: 2003-059879 (2003-02-01), None

Affiliated with

Also associated with

Rating

Substrate treating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate treating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate treating apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3799892