Coating processes – Spray coating utilizing flame or plasma heat – Nonuniform or patterned coating
Reexamination Certificate
2006-01-12
2009-06-09
Moore, Karla (Department: 1792)
Coating processes
Spray coating utilizing flame or plasma heat
Nonuniform or patterned coating
C427S446000, C427S453000, C427S250000, C427S261000, C427S264000, C427S270000, C427S271000, C118S500000, C361S234000, C279S128000
Reexamination Certificate
active
07544393
ABSTRACT:
The susceptor of a plasma treating device, or the electrostatic chuck of a substrate table, is formed by ceramic thermal spray method. A thermally sprayed ceramic layer is pore-sealed by methacrylic resin. Resin raw material mainly containing methyl methacrylate is applied to and impregnated into the thermally sprayed ceramic layer and then is cured to thereby fill pores between ceramic particles in the thermally sprayed ceramic layer with methacrylic resin. Methacrylic resin raw material solution, which does not produce pores at curing, can complete perfect pore sealing.
REFERENCES:
patent: 4147821 (1979-04-01), Young
patent: 4480284 (1984-10-01), Tojo et al.
patent: 5720818 (1998-02-01), Donde et al.
patent: 5792562 (1998-08-01), Collins et al.
patent: 6120661 (2000-09-01), Hirano et al.
patent: 6358466 (2002-03-01), Besser et al.
patent: 7067178 (2006-06-01), Muto et al.
patent: 2004/0058070 (2004-03-01), Takeuchi et al.
patent: 63274704 (1988-11-01), None
patent: 6-196548 (1994-07-01), None
patent: 6-232243 (1994-08-01), None
patent: 09213777 (1997-08-01), None
patent: 11-10472 (1999-01-01), None
patent: 2000-183145 (2000-06-01), None
patent: 2001-7189 (2001-01-01), None
patent: 1996-0030364 (1996-08-01), None
patent: 2000-0006012 (2000-01-01), None
Muto Shinji
Okayama Nobuyuki
Taguchi Chihiro
Moore Karla
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
LandOfFree
Substrate table, production method therefor and plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate table, production method therefor and plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate table, production method therefor and plasma... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4122983