Substrate table, production method therefor and plasma...

Details Substrate table, production method therefor and plasma... Substrate table, production method therefor and plasma...

2006-06-27

2006-06-27

Moore, Karla (Department: 1763)

Coating processes

Spray coating utilizing flame or plasma heat

Nonuniform or patterned coating

C427S446000, C427S453000, C427S250000, C427S261000, C427S264000, C427S270000, C427S271000, C118S724000, C118S725000, C118S728000, C118S500000, C156S345510, C156S345520, C156S345530

Reexamination Certificate

active

07067178

ABSTRACT:
The susceptor (10) of a plasma treating device, or the electrostatic chuck (12) of a substrate table is formed by ceramic thermal spray method. A ceramic spray layer (12A) is pore-sealed by methacrylic resin (12D). Resin raw material mainly containing methyl methacrylate is applied to and impregnated into the ceramic spray layer and then is cured to thereby fill pores between ceramic particles in the ceramic spray layer with methacrylic resin. Methacrylic resin raw material solution, which does not produce pores at curing, can complete perfect pore sealing.

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