Substrate support lift mechanism

Details Substrate support lift mechanism Substrate support lift mechanism

2011-01-18

2011-01-18

MacArthur, Sylvia R. (Department: 1716)

Coating apparatus

Gas or vapor deposition

Work support

C414S680000, C204S298010, C156S345230

Reexamination Certificate

active

07871470

ABSTRACT:
An apparatus for positioning a substrate support within a processing chamber is provided. In one embodiment, an apparatus for positioning a substrate support includes a yoke comprising a curved surface with a first slot formed therethrough, a base comprising a first surface adapted to support the substrate support and a curved second surface, wherein the curved second surface mates with the curved surface of the yoke and a first slot is formed through the curved second surface of the base, and a first threaded member disposed through the first slot in the yoke and the first slot in the base.

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