Electric resistance heating devices – Heating devices – Radiant heater
Reexamination Certificate
2006-07-11
2011-11-08
Campbell, Thor (Department: 3742)
Electric resistance heating devices
Heating devices
Radiant heater
C392S407000
Reexamination Certificate
active
08055125
ABSTRACT:
A substrate stage mechanism (10) configured to place a substrate (W) thereon inside a process container of a substrate processing apparatus (100) and having a substrate heating function for heating the substrate (W) includes a substrate table (11) including a base body (11a) configured to place the substrate (W) thereon and a heating element (13) provided to the base body (11a) and configured to heat the substrate (W); a support member (12) having an upper end connected to the substrate table (11) and a lower end attached to the process container; and a heating device (17) configured to heat the support member (12).
REFERENCES:
patent: 2003/0180034 (2003-09-01), Saito et al.
patent: 62 59984 (1987-03-01), None
patent: 7 272834 (1995-10-01), None
patent: 2001 237051 (2001-08-01), None
patent: 2001 327051 (2001-08-01), None
patent: 2001 250858 (2001-09-01), None
patent: 2003 215964 (2003-07-01), None
patent: 2003 289024 (2003-10-01), None
patent: 2003 297534 (2003-10-01), None
patent: 2004 71172 (2004-03-01), None
International Search Report issued Oct. 17, 2006 in PCT/JP06/313754 filed Jul. 11, 2006.
Campbell Thor
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
LandOfFree
Substrate stage mechanism and substrate processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate stage mechanism and substrate processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate stage mechanism and substrate processing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4290982