Substrate reclaim method

Details Substrate reclaim method Substrate reclaim method

1995-01-23

1996-10-08

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 75, 216 58, 21912169, B08B 500

Patent

active

055628400

ABSTRACT:
There is disclosed a substrate reclaim method comprising directing laser energy at a coating covering a part of an outer surface of a substrate, wherein the outer surface has a shiny finish, thereby removing with the laser energy all of the coating on the outer surface and etching with the laser energy a portion of the outer surface to change the etched outer surface portion from a shiny finish to a matte finish.

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