Cleaning and liquid contact with solids – Processes – Combined
Reexamination Certificate
2003-08-28
2011-12-13
Kornakov, Michael (Department: 1714)
Cleaning and liquid contact with solids
Processes
Combined
C216S059000
Reexamination Certificate
active
08075698
ABSTRACT:
A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.
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Ishizaka Tadahiro
Kannan Hiroshi
Kojima Yasuhiko
Oshima Yasuhiro
Shigeoka Takashi
Golightly Eric
Kornakov Michael
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
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