Substrate processing method and substrate processing apparatus

Details Substrate processing method and substrate processing apparatus Substrate processing method and substrate processing apparatus

2007-02-27

2007-02-27

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

With treating fluid motion

C134S002000, C134S032000, C134S033000, C134S034000, C216S090000, C216S091000, C438S906000

Reexamination Certificate

active

10413608

ABSTRACT:
Disclosed is a substrate processing method including a substrate rotating step for rotating a substrate with the substrate held almost horizontally within a chamber; a peripheral edge processing step for discharging a processing liquid to a lower surface of the substrate rotated in the substrate rotating step and causing the processing liquid to flow around an upper surface of the substrate at a peripheral edge thereof from the lower surface of the substrate to process the peripheral edge of the upper surface of the substrate in the chamber; and a both-surface processing step for discharging the processing liquid to both the surfaces of the substrate rotated in the substrate rotating step to process both the surfaces of the substrate in the chamber.

REFERENCES:
patent: 5608943 (1997-03-01), Konishi et al.
patent: 6485576 (2002-11-01), Huang et al.
patent: 2003/0073320 (2003-04-01), Emami
patent: 9-141191 (1997-06-01), None
patent: 9-293715 (1997-11-01), None
patent: 09-330904 (1997-12-01), None
patent: 2000-91212 (2000-03-01), None
patent: 2002-110626 (2002-04-01), None

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