Substrate processing equipment

Details Substrate processing equipment Substrate processing equipment

2004-06-18

2008-03-18

Paik, Sang (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C219S483000

Reexamination Certificate

active

07346273

ABSTRACT:
It is an object of the invention to provide a substrate processing equipment that can predict a temperature of a substrate and easily control temperature of the substrate. Formed in a reactor (processing chamber)3are four temperature adjustment zones, of which setting and adjustment of temperature can be made by zone heaters340-1to340-4. A temperature controller4mixes temperatures detected by inner thermocouples302-1to302-4and outer thermocouples342-1to342-4to calculate predicted temperatures of substrates by means of the first-order lag calculation on the basis of time constants of temperatures of substrates heated by the zone heaters340-1to340-4. Also, the temperature controller4calculates electric power values (operating variables) for the zone heaters340-1to340-4with the use of predicted temperatures of substrates to output the same to the zone heaters340-1to340-4.

REFERENCES:
patent: 5593608 (1997-01-01), Suzuki
patent: 6495805 (2002-12-01), Sakamoto et al.
patent: A 07-283158 (1995-10-01), None
patent: A 2002-091574 (2002-03-01), None
patent: A 2002-175123 (2002-06-01), None

Affiliated with

Also associated with

Rating

Substrate processing equipment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing equipment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing equipment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3971127