Substrate processing chamber with dielectric barrier...

Details Substrate processing chamber with dielectric barrier... Substrate processing chamber with dielectric barrier...

2011-07-12

2011-07-12

Campbell, Thor S (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C392S407000, C392S422000

Reexamination Certificate

active

07978964

ABSTRACT:
A thermal processing chamber with a dielectric barrier discharge (DBD) lamp assembly and a method for using the same are provided. In one embodiment, a thermal processing chamber includes a chamber body and a dielectric barrier discharge lamp assembly. The dielectric barrier discharge lamp assembly further comprises a first electrode, a second electrode and a dielectric barrier. The dielectric barrier discharge lamp assembly is positioned between the first electrode and the second electrode. The dielectric barrier defines a discharge space between the dielectric barrier and the second electrode. A circuit arrangement is coupled to the first and second electrodes, and is adapted to operate the dielectric barrier discharge lamp assembly.

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