Substrate processing apparatus, liquid film freezing method...

Cleaning and liquid contact with solids – Processes – Including forming a solidified or hardened coating for cleaning

Reexamination Certificate

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Details

C134S030000, C134S031000, C134S033000, C134S037000, C134S902000

Reexamination Certificate

active

08029622

ABSTRACT:
A cooling gas is discharged from a cooling gas discharge nozzle toward a local section of a front surface of a substrate on which a liquid film is formed. And then the cooling gas discharge nozzle moves from a rotational center position of the substrate toward an edge position of the substrate along a moving trajectory while the substrate is rotated. As a result, of the surface region of the front surface of the substrate, an area where the liquid film has been frozen (frozen area) expands toward the periphery edge from the center of the front surface of the substrate. It is therefore possible to form a frozen film all over the front surface of the substrate while suppressing deterioration of the durability of the substrate peripheral members since a section receiving supply of the cooling gas is limited to a local area on the front surface of the substrate.

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Each item of information contained in this Information Disclosure Statement was first cited in a communication from a foreign patent office in a counterpart application and this communication was not received by any individual designated in section 1.56(c) more than thirty days prior to the filing of this Information Disclosure Statement, Dec. 29, 2010.

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