Photography – Fluid-treating apparatus – Fluid application to one side only of photographic medium
Reexamination Certificate
1999-07-30
2001-03-20
Rutledge, D. (Department: 2851)
Photography
Fluid-treating apparatus
Fluid application to one side only of photographic medium
C396S627000, C156S583200, C118S052000
Reexamination Certificate
active
06203218
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to a substrate processing apparatus and a substrate processing method for processing the edge portion of a substrate for a color filter in a liquid crystal color display, for example, after a resist is applied thereto.
BACKGROUND OF THE INVENTION
A color filter in a liquid crystal color display requires the formation of a colored pattern of R, G, and B on a glass substrate. Such a colored pattern is formed, for example, by a photolithography method. As an example thereof, a precolored resin made from a photosensitive resin is used for each of R, G, and B, and the process of coating-exposure-developing is repeated three times for R, G, and B to form a pattern.
Incidentally, in the above developing process, negative type development processing in which an unexposed portion of the photosensitive resin is removed with a developing solution to thereby form a pattern is performed. Generally in a process after resist-coating, edge processing for removing a resist remaining at the edge portion of the glass substrate is needed. Hence, in the negative type processing, the aforesaid edge processing is performed with a developing solution.
Meanwhile, in positive type edge processing, edge processing in which a resist remaining at the edge portion of the glass substrate is removed with an organic solvent such as a thinner is performed.
SUMMARY OF THE INVENTION
However, in the case where a developing solution is used in edge processing as described above, there is a disadvantage that rinse processing with a rinse solution such as demineralized water or the like is needed after the developing solution is used, which causes an increase in the number of processes and an increase in installation.
The present invention is made to eliminate the above disadvantage and the object thereof is to provide a substrate processing apparatus and a substrate processing method in which the edge processing of a substrate can be performed with minimal increases in the number of processes and in installation.
In order to eliminate the above disadvantage, as one of the main aspects of the present invention, a substrate processing apparatus includes a holding member for holding a substrate, a first nozzle having a plurality of discharge ports each for discharging a developing solution to an edge portion of the substrate held by the holding member, a second nozzle disposed adjacent to the first nozzle and having a discharge port for discharging a rinse solution to the edge portion of the substrate held by the holding member, and carrying means for carrying the second nozzle and the first nozzle in the direction of one side of the substrate held by the holding member.
Accordingly, such a structure that a developing solution is discharged from the first nozzle and a rinse solution is discharged from the second nozzle disposed at the rear in a carrying direction is provided, whereby the removal of the remnants at the edge portion of the substrate with a developing solution and the removal of the developing solution with a rinse solution can be performed at the same time. Moreover, the first and the second nozzles are provided in one head, thereby simplifying the configuration and facilitating the control thereof. As a result, the edge processing of a substrate can be performed with minimal increases in the number of processes and in installation.
These objects and still other objects and advantages of the present invention will become apparent upon reading the following specification when taken in conjunction with the accompanying drawings.
REFERENCES:
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patent: 5871584 (1999-02-01), Tateyama et al.
patent: 5984540 (1999-11-01), Mimasaka et al.
patent: 6012858 (2000-01-01), Konishi et al.
patent: 6062288 (2000-05-01), Tateyama
patent: 9-260278 (1997-10-01), None
Omori Tsutae
Sakai Mitsuhiro
Tanaka Shinobu
Rader Fishman & Grauer
Rutledge D.
Tokyo Electron Ltd.
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