Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2005-05-17

2005-05-17

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

C430S322000, C430S313000, C430S317000, C118S715000, C118S729000, C438S782000, C438S780000, C438S778000

Reexamination Certificate

active

06893805

ABSTRACT:
A substrate processing apparatus provided with: a coating processing section for supplying a coating solution to a substrate; a pressure processing section for pressurizing a coating film formed on the substrate; and a developing processing section for supplying a developing solution to the substrate having the coating film selectively exposed to light with the use of an exposure mask. The pressure processing section may be arranged such that a pressing plate having a flat face is brought into pressure contact with the coating film.

REFERENCES:
patent: 5674659 (1997-10-01), Matsuo et al.
patent: 6010570 (2000-01-01), Motoda et al.
patent: 6361927 (2002-03-01), Park
patent: 06-222562 (1994-08-01), None
patent: 10-135198 (1998-05-01), None

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