Substrate processing apparatus and substrate processing method

Details Substrate processing apparatus and substrate processing method Substrate processing apparatus and substrate processing method

2005-01-11

2005-01-11

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

C430S328000, C438S758000, C118S302000, C392S416000, C392S418000

Reexamination Certificate

active

06841342

ABSTRACT:
A substrate processing apparatus for processing a substrate coated with a chemical amplification type resist and subjected to a light-exposure treatment comprises a substrate table on which is disposed a substrate, a heater for heating the substrate disposed on the substrate table, and an electric field forming mechanism for forming an electric field exerting force, which is directed toward the substrate, on the protons generated in the resist formed on the substrate disposed on the substrate table.

REFERENCES:
patent: 5685949 (1997-11-01), Yashima
patent: 6458430 (2002-10-01), Bernstein et al.
patent: 6686132 (2004-02-01), Cheng et al.
patent: 20020123011 (2002-09-01), Kawano et al.

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