Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports
Reexamination Certificate
2008-07-09
2011-11-15
Fox, Charles A (Department: 3652)
Radiant energy
Inspection of solids or liquids by charged particles
Analyte supports
C355S073000
Reexamination Certificate
active
08058628
ABSTRACT:
Substrate processing methods and apparatus are disclosed. In some embodiments a substrate processing apparatus may comprise a support structure and a moveable stage including first and second stages. The moveable stage has one or more maglev units attached to the first stage and/or second stage proximate an edge of the first stage. The first stage retains one or more substrates and moves with respect to a first axis that is substantially fixed with respect to the second stage. The second stage translates along a second axis with respect to the support structure. In other embodiments, a primary motor may maintain a rotary stage at an angular speed and/or accelerate or decelerate the stage from a first angular speed to a second angular speed. A secondary motor may accelerate the stage from rest to the first angular speed and/or decelerate the stage from a non-zero angular speed.
REFERENCES:
patent: 5201249 (1993-04-01), Sterenberg
patent: 5641960 (1997-06-01), Okubo et al.
patent: 6304320 (2001-10-01), Tanaka et al.
patent: 6515742 (2003-02-01), Ruprecht
patent: 6552449 (2003-04-01), Tsuboi et al.
patent: 6552773 (2003-04-01), Emoto
patent: 7060439 (2006-06-01), Gordon
patent: 7288859 (2007-10-01), Hazelton
patent: 7633070 (2009-12-01), Zywno
patent: 2002/0047542 (2002-04-01), Higuchi
patent: 2003/0230323 (2003-12-01), You et al.
patent: 2004/0051403 (2004-03-01), Tsuboi et al.
patent: 2005/0092013 (2005-05-01), Emoto
patent: 2006/0054494 (2006-03-01), Reiss
patent: 2008/0122294 (2008-05-01), Simon et al.
patent: 2008/0142733 (2008-06-01), Zywno
patent: WO 9715978 (1997-05-01), None
patent: WO 2005078526 (2005-08-01), None
patent: WO 2006007167 (2006-01-01), None
Notice of Allowance and Fees Due dated Aug. 7, 2009 for U.S. Appl. No. 11/670,896.
Office Action for U.S. Appl. No. 11/670,896 dated Mar. 9, 2000.
International Search Report and Written Opinion of the International Searching Authority dated Sep. 23, 2008—International Patent Application No. PCT/US07/87953.
U.S. Appl. No. 60/870,528, to Marek Zywno et al., “Substrate Processing Apparatus and Method” filed Dec. 18, 2006.
U.S. Appl. No. 11/532,748 to Yehiel Gotkis et al., entitled “Temperature Stabilization for Substrate Processing” filed Sep. 18, 2006.
U.S. Appl. No. 60/948,667, to Marek Zywno et al., entitled “Substrate Processing Apparatus and Method” filed Jul. 9, 2007.
U.S. Appl. No. 12/335,736, to Marek Zywno et al., entitled “Dynamo Tracking of Wafer Motion and Distortion During Lithography”, filed Dec. 16, 2008.
Bareket Noah
Zywno Marek
Fox Charles A
Isenberg Joshua D.
JDI Patent
KLA-Tencor Corporation
LandOfFree
Substrate processing apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate processing apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4263555