Substrate processing apparatus and method

Details Substrate processing apparatus and method Substrate processing apparatus and method

2005-05-17

2009-10-27

Stinson, Frankie L (Department: 1792)

Cleaning and liquid contact with solids

Processes

With work or work parts movable during treatment

C134S182000, C134S183000, C134S902000

Reexamination Certificate

active

07608152

ABSTRACT:
In the vicinity of a rim portion of a spin base5, a plurality of supports7which abut on a bottom rim portion of a substrate W and support the substrate W are formed projecting toward above from the spin base5. The substrate W is supported horizontally by the plurality of supports7, with a predetermined distance ensured from the spin base5which opposes the bottom surface of the substrate W. Into the space which is created between the top surface of the substrate W and an opposing surface9aof an atmosphere blocker plate9, inert gas is ejected from a plurality of gas ejection outlets9bwhich are formed in the opposing surface9a. The inert gas thus supplied to the top surface of the substrate W presses the substrate W against the supports7and the substrate W is held at the spin base5.

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Office Action issued Jun. 6, 2008 for the corresponding Chinese Patent Application No. 200510076190.6.
U.S. Office Action issued in corresponding U.S. Appl. No. 11/154,363.

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