Substrate processing apparatus and cleaning method of the same

Details Substrate processing apparatus and cleaning method of the same Substrate processing apparatus and cleaning method of the same

2009-10-15

2011-11-08

Vanore, David A (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492300, C250S493100, C315S111810, C315S111910

Reexamination Certificate

active

08053747

ABSTRACT:
A method for cleaning a substrate processing apparatus in which a first ion beam generator and a second ion beam generator are arranged opposite to each other to sandwich a plane on which a substrate is to be placed, and which processes two surfaces of the substrate, comprises steps of retreating the substrate from a position between the first ion beam generator and the second ion beam generator, and cleaning the second ion beam generator by emitting an ion beam from the first ion beam generator to the second ion beam generator.

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