Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2005-08-23

2005-08-23

Zervigon, Rudy (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

For liquid etchant

C156S345330, C156S345150, C156S345110, C015S077000, C204S198000

Reexamination Certificate

active

06932884

ABSTRACT:
A substrate processing apparatus comprises roll chucks for holding and rotating a substrate, a closable chamber housing the roll chucks therein, and a gas introduction pipe for introducing a gas into the chamber. The substrate processing apparatus further comprises an etching unit for etching and cleaning a peripheral portion of the substrate while the substrate is being rotated by the roll chucks, and a first supply passage for supplying a first liquid to the etching unit.

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patent: 6225235 (2001-05-01), Kunze-Concewitz
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patent: 6585876 (2003-07-01), Dordi et al.
patent: 2001/0017191 (2001-08-01), Hashimoto et al.
patent: 2001/0037858 (2001-11-01), Taniyama et al.
patent: 0 368 334 (1990-05-01), None
patent: 0 677 867 (1995-10-01), None

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