Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

1997-12-22

1999-07-27

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134153, 134902, 134200, B08B 302

Patent

active

059273038

ABSTRACT:
In a substrate processing apparatus wherein a substrate is held horizontally and rotated about a center axis which extends in a vertical direction to thereby supply processing liquid to the substrate, vortical grooves which are twisted in a direction of rotation of the substrate are formed in a cover surface which is a bottom surface of a cover plate which covers a top surface of the substrate across a gap. Although the processing liquid which is supplied to the substrate is scattered at the substrate and adhere as drops to the cover surface, subjected to force of an air stream which is created as a substrate rotates, the drops move along the grooves on the cover surface. This permits the drops on the cover surface to be smoothly discharged outside the cover surface without allowing the drops to fall off onto the substrate, which in turn improves the quality of the substrate.

REFERENCES:
patent: 4790262 (1988-12-01), Nakayama
patent: 4838979 (1989-06-01), Nishida
patent: 5156174 (1992-10-01), Thompson
patent: 5584310 (1996-12-01), Bergman
patent: 5762708 (1998-06-01), Motoda
patent: 5778913 (1998-07-01), Degani
patent: 5779796 (1998-07-01), Tomoeda

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