Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

1995-09-07

1998-06-09

Gorgos, Kathryn L.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

29 2501, 118719, 20429825, 20429835, 396571, 396611, 396642, 414217, 414935, 432253, H01L 2100

Patent

active

057627452

ABSTRACT:
A substrate processing apparatus includes a plurality of easily removable processing units including at least a heating unit for heating a substrate and a cooling unit for cooling the substrate, and an outer frame having a plurality of compartments. Each compartment has an opening through which a processing unit may be inserted or removed. The plurality of compartments are arranged vertically. Each compartment has a plurality of first joint members connected to utility lines including those of an electrical system, a control system, and a fluid system. The electrical, control, and fluid systems are necessary for operating the processing units. Each processing unit has a plurality of second joint members connected to the first joint members.

REFERENCES:
patent: 4722298 (1988-02-01), Rubin
patent: 5076205 (1991-12-01), Vowles et al.
patent: 5339128 (1994-08-01), Tateyama et al.

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