Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2008-10-21

2011-12-06

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C156S345310, C156S345330, C156S345240, C156S345270, C118S725000

Reexamination Certificate

active

08070880

ABSTRACT:
Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube, a substrate holder, a gas nozzle, a heating unit, a temperature detector, and an exhaust unit. The reaction tube accommodates and processes substrates. The substrate holder holds substrates stacked at predetermined intervals in the reaction tube. The gas nozzle is installed along a stacked direction of the substrates. The heating unit heats the substrates. The temperature detector is installed along the stacked direction of the substrates. The exhaust unit exhausts an inside atmosphere of the reaction tube. Each of the gas nozzle and the temperature detector includes first and second parts and is supported by a narrow tube supporting member including first and second supporting parts. The first supporting part makes contact with the first part. The second supporting part is parallel with the second part and supports the second part.

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patent: 2009124105 (2009-06-01), None

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