Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2005-12-06

2011-10-18

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

With developing

C396S611000, C355S030000

Reexamination Certificate

active

08040488

ABSTRACT:
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.

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