Substrate position correcting method and apparatus using...

Material or article handling – Article reorienting device – Article frictionally engaged and rotated by relatively...

Reexamination Certificate

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C414S936000, C414S609000, C700S059000

Reexamination Certificate

active

07547181

ABSTRACT:
A substrate W rotates about the center of rotations A0of a spin base3, while supported by plural support pins5in such a manner that the substrate W can freely slide and while held owing to the force of friction which develops between the bottom surface of the substrate W and the support pins5. After a detection sensor74detects, while the substrate W rotates, an edge surface position (eccentric position) of the edge surface of the substrate which is the farthest from the center of rotations A0, a press block71pushes this edge surface position to a preset position P1which is away along the horizontal direction from the center of rotations A0by a distance which is determined in accordance with the radius of the substrate W. This aligns the eccentric position to the preset position P1and positions the center W0of the substrate within a predetermined range from the center of rotations A0.

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Japanese Office Action issued Sep. 2, 2008 in corresponding Japanese Patent Application 2004-330404.
Office Action issued Dec. 24, 2008 in corresponding Japanese Patent Application No. 2004-330405.

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