Substrate mounting table for plasma processing apparatus,...

Details Substrate mounting table for plasma processing apparatus,... Substrate mounting table for plasma processing apparatus,...

2011-03-29

2011-03-29

Wilson, Lee D (Department: 3727)

Work holders

Work-underlying support

Movable roller

C269S302100, C451S041000

Reexamination Certificate

active

07913987

ABSTRACT:
A substrate mounting table includes an electrostatic chuck for attracting and holding a target substrate and a base for holding the electrostatic chuck thereon. The base includes a protruding portion having a large height; and an outer peripheral surface provided around the protruding portion at a position lower than the protruding portion by a preset height. A thermally sprayed film having a thickness equivalent to a height difference between the protruding portion and the outer peripheral surface is deposited on the outer peripheral surface such that the thermally sprayed film becomes continuous with the protruding portion. The electrostatic chuck is formed by installing an electrode between insulating members, and the electrostatic chuck is fixed to the base by using an adhesive to cover a boundary between a top surface of the protruding portion and a surface of the thermally sprayed film.

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Office action for Appl. No. JP 2008-029189 dated Nov. 17, 2009.
Chinese Office action for 2009100051873 dated Feb. 5, 2010.
Korean Office action for 10-2009-0009655 dated Nov. 15, 2010.

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