Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Reexamination Certificate
2007-11-06
2007-11-06
Sherry, Michael (Department: 2836)
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
C361S235000
Reexamination Certificate
active
10952732
ABSTRACT:
A substrate holding system having a chuck for vacuum attraction and electrostatic attraction of a substrate. The system includes a ring-like rim for carrying a substrate thereon, a plurality of first protrusions disposed inside the rim, for carrying the substrate thereon, and a plurality of second protrusions disposed inside the rim, for carrying the substrate thereon. A substrate carrying surface area of at least one first protrusion is smaller than a substrate carrying surface area of at least one second protrusion and a smallest interval between the first protrusions is smaller than a smallest interval between the second protrusions. Also included are an exhaust system for exhausting a clearance between the chuck and the substrate, an electrode for electrostatic attraction, a power supplying system for supplying power to the electrode, a measuring system for measuring a pressure in the clearance, and a control system for controlling the power supply.
REFERENCES:
patent: 4551192 (1985-11-01), Di Milia et al.
patent: 4969168 (1990-11-01), Sakamoto et al.
patent: 5315473 (1994-05-01), Collins et al.
patent: 5841624 (1998-11-01), Xu et al.
patent: 5886863 (1999-03-01), Nagasaki et al.
patent: 5923408 (1999-07-01), Takabayashi
patent: 6226073 (2001-05-01), Emoto
patent: 6552773 (2003-04-01), Emoto
patent: 6741446 (2004-05-01), Ennis
patent: 6810298 (2004-10-01), Emoto
patent: 2002/0000029 (2002-01-01), Emoto
patent: 2002/0132409 (2002-09-01), Akutsu et al.
patent: 2003/0007136 (2003-01-01), Emoto et al.
patent: 2003/0035088 (2003-02-01), Emoto
patent: 2004/0080727 (2004-04-01), Emoto
patent: 0 357 424 (1990-03-01), None
patent: 0 693 774 (1996-01-01), None
patent: 1 191 580 (2002-03-01), None
patent: 2 149 697 (1985-06-01), None
patent: 4-147643 (1992-05-01), None
patent: 6-47642 (1994-02-01), None
patent: 6-63885 (1994-03-01), None
patent: 6-240325 (1994-07-01), None
patent: 2587227 (1996-12-01), None
patent: 2633516 (1997-04-01), None
patent: 2003-142393 (2003-05-01), None
patent: WO 00/65645 (2000-02-01), None
“Combined Contactless Electrostatic and Vacuum Wafer Chuck,” IBM Technical Disclosure Bulletin vol. 27, No. 10B, IBM Corp., NY, Mar. 1985, p. 6222.
European Search Report dated Jan. 20, 2006, issued in corresponding European patent appln. No. EP 04 25 6036, forwarded in a Communication dated Feb. 3, 2006.
Japanese Office Action dated Sep. 6, 2006, issued in corresponding Japanese patent application No. 2003-343676, with an English translation.
Emoto Keiji
Ito Atsushi
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Nguyen Danny
Sherry Michael
LandOfFree
Substrate holding system and exposure apparatus using the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate holding system and exposure apparatus using the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate holding system and exposure apparatus using the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3878778