Substrate holding device and polishing device

Abrading – Work holder – Vacuum

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C451S389000

Reexamination Certificate

active

07033260

ABSTRACT:
The present invention relates to a substrate holding apparatus for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The substrate holding apparatus according to the present invention comprises a top ring body having a receiving space therein, and a vertically movable member which is vertically movable within the receiving space in the top ring body. An abutment member having an elastic membrane is attached to a lower surface of the vertically movable member. The elastic membrane of the abutment member comprises an abutment portion, having a flange projecting outwardly, brought into direct or indirect contact with the substrate, and a connecting portion extending upwardly from a base portion of the flange of the abutment portion and being connected to the vertically movable member. The connecting portion is made of a material having a flexibility higher than that of material of the abutment portion.

REFERENCES:
patent: 6210255 (2001-04-01), Zuniga et al.
patent: 6390904 (2002-05-01), Gleason et al.
patent: 6422927 (2002-07-01), Zuniga
patent: 2002/0098780 (2002-07-01), Boo et al
patent: 1066925 (2001-01-01), None
patent: 8-229804 (1996-09-01), None
patent: 2000/301453 (2000-10-01), None
patent: 2001-60572 (2001-03-01), None
patent: 2001-260004 (2001-09-01), None
patent: 2002-187060 (2002-07-01), None
patent: 2002-198337 (2002-07-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate holding device and polishing device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate holding device and polishing device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate holding device and polishing device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3553124

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.