Substrate holding apparatus for processing semiconductor

Details Substrate holding apparatus for processing semiconductor Substrate holding apparatus for processing semiconductor

1998-12-17

2000-12-12

Mills, Gregory

Coating apparatus

Gas or vapor deposition

Work support

118724, 118725, 118723E, C23C 1600

Patent

active

06159301&

ABSTRACT:
A substrate-holding apparatus for holding a semiconductor substrate in a semiconductor processor is characterized in that the apparatus includes a mount block made of, e.g., aluminum nitrate with a high-frequency electrode embedded therein and a heating block made of, e.g., an aluminum alloy with a heating body embedded therein. The mount block is tightly attached to the heating block by engaging the bottom surface of the mount block with the top surface of the heating block, for example, by using a latching mechanism.

REFERENCES:
patent: 5665166 (1997-09-01), Deguchi et al.
patent: 5766364 (1998-06-01), Ishida et al.
patent: 5851298 (1998-12-01), Ishii

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