Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2011-08-30
2011-08-30
Gramaglia, Maureen (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
C118S722000, C118S728000, C156S345510, C156S345520, C156S345530
Reexamination Certificate
active
08007591
ABSTRACT:
A substrate holder (20) for supporting a substrate (30). A heating component (50) is positioned adjacent to a supporting surface and between the supporting surface and a cooling component (60). A fluid gap is positioned between the cooling component and the heating component, the fluid gap configured to receive a fluid to increase thermal conduction between the cooling component and the heating component. A brazing material is disposed between the cooling component and the heating component, the brazing material disposed adjacent to the fluid gap.
REFERENCES:
patent: 3909917 (1975-10-01), Lebedev et al.
patent: 5078851 (1992-01-01), Nishihata et al.
patent: 5280156 (1994-01-01), Niori et al.
patent: 5323292 (1994-06-01), Brzezinski
patent: 5730803 (1998-03-01), Steger et al.
patent: 5775416 (1998-07-01), Heimanson et al.
patent: 5810933 (1998-09-01), Mountsier et al.
patent: 6051074 (2000-04-01), Strodtbeck et al.
patent: 6180926 (2001-01-01), Duddy et al.
patent: 6190063 (2001-02-01), Akimoto
patent: 6508062 (2003-01-01), Flanigan
patent: 6646233 (2003-11-01), Kanno et al.
patent: 6736206 (2004-05-01), Hisai
patent: 7033444 (2006-04-01), Komino et al.
patent: 2001/0019472 (2001-09-01), Kanno et al.
patent: 2002/0050246 (2002-05-01), Parkhe
patent: 2003/0228772 (2003-12-01), Cowans
patent: 2004/0097088 (2004-05-01), Kitayama et al.
patent: 2004/0123805 (2004-07-01), Tomoyoshi
patent: 2004/0144561 (2004-07-01), Osanai et al.
patent: 02-263789 (1990-10-01), None
patent: 05-029448 (1993-02-01), None
patent: 09-172057 (1997-06-01), None
patent: 09-232415 (1997-09-01), None
patent: 10-150100 (1998-06-01), None
patent: 10-256359 (1998-09-01), None
patent: 11-110053 (1999-04-01), None
patent: 11-265931 (1999-09-01), None
patent: 2001-068538 (2001-03-01), None
patent: 2001-110883 (2001-04-01), None
patent: 2001-110885 (2001-04-01), None
patent: 2001-347480 (2001-12-01), None
patent: 2002-9064 (2002-01-01), None
patent: 2002-217178 (2002-08-01), None
patent: 58-182818 (2002-10-01), None
patent: 2002-327275 (2002-11-01), None
patent: 2002-343693 (2002-11-01), None
patent: 2003-179040 (2003-06-01), None
patent: 2003-243490 (2003-08-01), None
patent: 2003-282685 (2003-10-01), None
patent: 2001-0110737 (2001-12-01), None
English Translation of Japanese Office Action issued Mar. 8, 2011, in Patent Application No. 2006-551054.
Japanese Office Action dated Jul. 27, 2010 in JP Appl. No. 2006-528000 (with English Translation).
Japanese Office Action dated Dec. 7, 2010 in JP Appl. No. 2006-528000 (with English Translation).
Korean Office Action dated Oct. 1, 2010 in KR Appl. No. 10-2006-7007931 (with English Translation).
Korean Office Action issued Apr. 27, 2011 in Korean Patent Application No. 10-2006-7009950 (with English translation).
Gramaglia Maureen
Nuckols Tiffany
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
LandOfFree
Substrate holder having a fluid gap and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate holder having a fluid gap and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate holder having a fluid gap and method of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2708104