Substrate holder for reducing non-uniform film characteristics r

Coating apparatus – Work holders – or handling devices

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Details

118728, 118503, B05C 1300

Patent

active

059762551

ABSTRACT:
A substrate holder to support a substrate in a vertical position in a substrate processing device that performs a process on the substrate, where the process involves forming a plasma in the space around the substrate. The substrate holder includes a base plate and a plurality of supporting claws that are attached to the base plate and arranged so as to come into contact with the outer edge of the substrate and provide vertical support for the substrate. At least one of the plurality of supporting claws is a movable supporting claw that can be brought into contact with and separated from the outer edge of the substrate. When a substrate has been loaded into the holder, the space around the substrate is substantially filled by the base plate or by a member attached to the base plate. The gap formed around the periphery of the substrate between the substrate and base plate is narrower at locations in the circumferential direction to the front and rear of the supporting claws, compared to that at other positions in the circumferential direction along the periphery of the substrate.

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