Substrate holder for etching thin films

Details Substrate holder for etching thin films Substrate holder for etching thin films

1975-12-24

1976-11-23

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250442, H01J 3700

Patent

active

039939090

ABSTRACT:
Substrate holder for etching thin films by means of an ion beam in which a driving device moves the surface of a substrate placed on a turntable with respect to the ion beam, which holder includes a friction disk which rotates in rolling contact with a surface of a driving disk carrying the turntable and is spaced from the axis of the driving disk by a distance equal to that at which the point of impact of the ion beam on the substrate is located.

REFERENCES:
patent: 3388099 (1968-06-01), King
patent: 3496029 (1970-02-01), King et al.
patent: 3497689 (1970-02-01), Helwig et al.
patent: 3629577 (1971-12-01), Weber et al.
patent: 3648048 (1972-03-01), Cahan et al.
patent: 3689766 (1972-12-01), Freeman
patent: 3778626 (1973-12-01), Robertson

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