Substrate holder and method of use

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156345, 267287, 267903, 118503, B23Q 300

Patent

active

055781675

ABSTRACT:
The etching of a thin substrate (23) is performed using a holder (10). The holder (10) has a base (11) that has a cavity (20). The cavity (20) is pressurized to compensate for the pressure and stress that is applied to the substrate (23) by an etchant solution. The holder (10) also has a sequence of o-rings (22,24,26) that are used to hold the substrate (23) in place and to prevent etchant from leaking into the cavity (20) and attacking a bottom surface (32) of the substrate (23). The pressure necessary to hold the substrate (23) in place is applied by a cover ring (28) that is screwed onto the base (11).

REFERENCES:
J. Kung et al., "A Compact, Inexpensive Apparatus for One-sided Etching in KOH and HF", Sensors and Actuators A, 29 (1991), pp. 209-215.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate holder and method of use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate holder and method of use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate holder and method of use will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1970331

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.