Substrate hold apparatus and method for judging substrate...

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

08040655

ABSTRACT:
A substrate hold apparatus is provided an electrostatic chuck for electrostatically attracting and holding a substrate thereon, a push-up member contactable with a position of vicinity of an edge of the substrate on the electrostatic chuck from below for pushing up the substrate, a drive apparatus for driving at least one of the electrostatic chuck and push-up member to thereby allow the push-up member to push up the substrate, a force sensor for detecting a force applied to the push-up member in an pushing-up operation, and a control unit wherein the control unit is configured to measure the force from the force sensor as a first measurement, output a normal state signal when the measured force in the first measurement is equal to or larger than a lower limit value and is equal to or smaller than a upper limit value.

REFERENCES:
patent: 5677824 (1997-10-01), Harashima et al.
patent: 6646857 (2003-11-01), Anderson et al.
patent: 6938505 (2005-09-01), Chen et al.
patent: 2006/0238953 (2006-10-01), Hanawa et al.
patent: 2-257455 (1990-10-01), None
patent: 4-110274 (1992-04-01), None
patent: 10183345 (1998-07-01), None
patent: 2004-119792 (2004-04-01), None
patent: 2004-228488 (2004-08-01), None
patent: 2004-531883 (2004-10-01), None
patent: 3814905 (2006-06-01), None
Patent Abstracts of Japan for Japanese Publication No. 2004-119792, Publication date Apr. 15, 2004 (2 pages).
Patent Abstracts of Japan for Japanese Publication No. 10-183345, Publication date Jul. 14, 1998 (2 pages) (Corresponds to JP3814905).
Japanese Office Action for Japanese Application No. 2007-021021, dated Nov. 6, 2008 (9 pages).
Patent Abstracts of Japan for Japanese Publication No. 2004-228488, Publication date Aug. 12, 2004 (1 page).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Substrate hold apparatus and method for judging substrate... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate hold apparatus and method for judging substrate..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate hold apparatus and method for judging substrate... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4298711

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.