Substrate having fine line, electron source and image...

Details Substrate having fine line, electron source and image... Substrate having fine line, electron source and image...

2005-05-12

2010-10-05

Davis, Daborah Chacko (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S313000, C430S394000, C430S330000

Reexamination Certificate

active

07807334

ABSTRACT:
As a substrate having a fine line and capable of suppressing crack generation in the substrate and peeling of the fine line, the invention discloses a configuration in which plural recesses are arranged on the fine line, and particularly a configuration in which the interval of the plural recesses does not exceed 200 μm. There is also disclosed a configuration in which the plural recesses are arranged along a direction crossing the longitudinal direction of the fine line.

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Official Action dated Oct. 5, 2009 in European Application No. 01 129 851.0.
Database WPI Section EI, XP-002266405, Thomson Scientific, London, GB, May 6, 2000.

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