Substrate handling and transporting apparatus

Details Substrate handling and transporting apparatus Substrate handling and transporting apparatus

1989-02-24

1991-06-04

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

414217, 414225, C23C 1600

Patent

active

050204750

ABSTRACT:
A substrate loading subsystem receives substrates from an external source and delivers them to an input port. A substrate pickup transports the substrates serially from the input port to a delivery port of a processing subsystem wherein the substrates are subjected to a reactant gas in a reaction chamber. After completion of the chemical vapor deposition, the substrate pick up serially transports the substrates to an outlet port wherefrom they are off loaded.

REFERENCES:
patent: 4501527 (1985-02-01), Jacoby
patent: 4553069 (1985-11-01), Purser
patent: 4592306 (1986-06-01), Gallego

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