Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Including heating
Reexamination Certificate
2007-02-16
2011-12-27
Davis, Daborah Chacko (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Including heating
C430S030000, C427S145000, C118S052000, C118S066000, C134S001300, C134S152000, C134S032000
Reexamination Certificate
active
08084194
ABSTRACT:
A method of substrate edge treatment includes forming a processing target film on a treatment target substrate, applying an energy line to a predetermined position on the processing target film to form a latent image on the processing target film, heating the treatment target substrate in which the latent image is formed on the processing target film, developing the processing target film after the heating, inspecting whether a residue is present at an edge of the treatment target substrate after the developing, and cleaning an end of the treatment target substrate to remove the residue at the edge of the treatment target substrate determined to be defective in the inspecting.
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Japanese Office Action issued Feb. 15, 2011, in Patent Application No. 2006-039361 (with English-language translation).
Office Action issued Jul. 5, 2011, in Japanese Patent Application No. 2006-039361 (with English-language Translation).
Kobayashi Yuji
Takeishi Tomoyuki
Chacko Davis Daborah
Kabushiki Kaisha Toshiba
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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