Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor
Patent
1994-10-28
1996-11-19
Kwon, John T.
Drying and gas or vapor contact with solids
Apparatus
With means to treat gas or vapor
34470, F26B 2106
Patent
active
055750796
ABSTRACT:
A substrate drying apparatus includes a process bath having an object containing region for containing an object to be treated, a treatment liquid containing region for containing a volatile treatment liquid, and heating member for evaporating the treatment liquid, a receiving container, provided below the object containing region, for receiving water removed from the object with use of the evaporated treatment liquid, an exhaust pipe, attached to the container, for exhausting the water from the container to the outside of the process bath, and a cooling device, provided above the object containing region of the process bath, for condensing the evaporated treatment liquid, wherein the exhaust pipe has a valve and a branch pipe branched from the exhaust pipe such that the branch pipe is closer to the container than the valve is.
REFERENCES:
patent: 4601115 (1986-07-01), Draper et al.
patent: 5142873 (1992-09-01), Ramsey, Jr.
patent: 5243769 (1993-09-01), Wang et al.
patent: 5369891 (1994-12-01), Kamikawa
patent: 5371950 (1994-12-01), Schumacher
patent: 5443540 (1995-08-01), Kamikawa
patent: 5456022 (1995-10-01), McLeod et al.
Minami Teruomi
Mokuo Shori
Tanaka Hiroshi
Yokomizo Kenji
Kwon John T.
Tokyo Electron Kyushu Limited
Tokyo Electron Limited
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