Substrate dryer and a drying method

Details Substrate dryer and a drying method Substrate dryer and a drying method

2011-02-15

2011-02-15

Deo, Duy-Vu N (Department: 1713)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001300, C438S745000, C438S746000, C438S747000, C438S748000

Reexamination Certificate

active

07887636

ABSTRACT:
A substrate dryer includes, among other things, means for generating isopropyl alcohol bubbles, and a vibrator to atomize stored isopropyl alcohol. A heater may be provided to heat pumped isopropyl alcohol, as wells as a spray nozzle to spray the heated IPA to the vibrator. It is possible to increase the concentration of the isopropyl alcohol supplied for the purpose of drying the substrate. Improved substrate drying is achieved.

REFERENCES:
patent: 5685086 (1997-11-01), Ferrell
patent: 6128830 (2000-10-01), Bettcher et al.
patent: 6216364 (2001-04-01), Tanaka et al.
patent: 6598312 (2003-07-01), Kim et al.
patent: 2005/0067001 (2005-03-01), Gast et al.
patent: 2005/0183755 (2005-08-01), Fujishima
patent: 6-216105 (1994-08-01), None
patent: 20-0182724 (2000-05-01), None
patent: 10-2004-0069650 (2004-08-01), None
English language abstract of Korean Publication No. 20-0182724.

Affiliated with

Also associated with

Rating

Substrate dryer and a drying method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate dryer and a drying method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate dryer and a drying method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2642792