Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-01-23
2007-01-23
Bueker, Richard (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S666000, C118S728000, C118S730000
Reexamination Certificate
active
11120195
ABSTRACT:
A substrate-coating system and an associated substrate-heating method, wherein the substrate-coating system is equipped with a substrate holder (1, 2) for holding at least one substrate at a coating position where it is coated on a coating side, and with a substrate heater (5, 6). The method includes heating at least one substrate that has been brought into such a system while it is being coated. The substrate heater includes a backside heater (6) for actively heating the substrate from its backside, i.e., that side opposite the side to be coated, while it is at its coating position. A heat-conducting element that is brought into thermal contact with a surface of the substrate may also be provided. Heater power is then regulated, based on the difference between the actual substrate temperature and a preset, desired, substrate temperature, and thereby limited such that the temperature of the heat-conducting element will not excessively increase over that of the substrate. The system and method are particularly applicable, e.g., to coating optical components fabricated from CaF2.
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Heller Matthias
Hsu Gean Jack
Michel Frank
Bueker Richard
Carl Zeiss SMT AG
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