Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2008-07-08
2008-07-08
Barr, Michael (Department: 1792)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S001300, C134S033000, C134S148000, C134S151000, C134S176000, C134S184000, C134S902000
Reexamination Certificate
active
10972026
ABSTRACT:
A substrate cleaning device comprises a chamber for cleaning a substrate; a substrate support installed in the chamber providing a surface for supporting the substrate during cleaning thereof; at least one cleaning solution supply outlet for spraying a cleaning solution onto a surface of the substrate; a vibration force generator for supplying a vibratory action; a vibration force generating shaft which receives said vibratory action from the vibration force generator so that said vibration force generating shaft vibrates for agitating the cleaning solution on the substrate; and a vibration force distributor for preventing a vibration force from being concentrated on a portion of the substrate below the vibration force generating shaft.
REFERENCES:
patent: 6679272 (2004-01-01), Bran et al.
patent: 6684890 (2004-02-01), Nicolosi et al.
patent: 7017597 (2006-03-01), Yoon et al.
patent: 7047989 (2006-05-01), Nicolosi et al.
patent: 2003/0015216 (2003-01-01), Nicolosi et al.
patent: 2003/0024547 (2003-02-01), Bran et al.
patent: 2003/0178049 (2003-09-01), Yoon et al.
patent: 2001-53047 (2001-02-01), None
patent: 2002-0022545 (2002-03-01), None
Barr Michael
Chaudhry Saeed T
Marger & Johnson & McCollom, P.C.
Samsung Electronics Co,. Ltd.
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